摘要
电介质/金属/电介质(D/M/D)结构透明导电薄膜是经过独特设计的一类性能优良的透明导电薄膜,经过多年研究,其各项性能指标得到了极大地提高,其应用范围也在不断拓展,目前已可应用于诸多领域。主要论述了D/M/D多层透明导电膜的研究现状,包括膜层设计原理、材料选择机制,并总结了金属层厚度、金属退火温度对膜系结构、光学、电学性质的影响机制。
Dielectric/metal/dielectric （D/M/D） multilayer films are one kind of transparent conductive films with high performance by unique design. It is widely recognized and have been applied to many areas own to the outstanding performance.This paper discussed the status, the designable principle, the material selecting mechanism of this field. It also summaries the controlling factors that promote the film structure, the optical and the electrical properties： such as the metal layer thickness and annealing temperature.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2017年第1期1056-1063,共8页
Journal of Functional Materials
基金
上海市教委重点创新资助项目(14ZZ137)
上海市大学生创新活动计划资助项目(SH2015098)
关键词
透明导电薄膜
D/M/D结构
金属膜厚度
退火温度
transparent conductive film
dielectric/metal/dielectric
metal layer thickness
annealing temperature
