摘要
通过制备Cu-Al-O薄膜并对其进行退火处理,研究了退火时间对薄膜形貌、结构以及紫外-可见透过率、带隙、中红外透过率的影响。研究结果表明:随着退火时间的增加,薄膜开始晶化,5.0 h时薄膜中出现裂纹,同时出现AlCu合金相;紫外-可见透过率随退火时间的增加而降低;中红外透过率随退火时间的增加先增加后降低;Cu-Al-O薄膜的直接带隙随退火时间的增加而降低。
The effect of annealing time on morphology, structure, uhraviolet-visible transmittance, band gap and mid-infrared transmittance of Cu-A1-O thin films was investigated by preparing and annealing the films. The results show that crystallization appears with the increasing of annealing time while cracks exists and A1Cu phase arises in Cu-A1-O thin film annealed for 5.0 h. The ultraviolet-visible transmittance decreases with increasing annealing time. Mid-infrared transmittance increases initially and then decreases with the increasing of annealing time. Be- sides, the direct band gap of Cu-A1-O thin films decreases with the increasing of annealing time.
出处
《机械科学与技术》
CSCD
北大核心
2013年第1期51-53,共3页
Mechanical Science and Technology for Aerospace Engineering
基金
航空科学基金项目(2008ZF53058)
凝固技术国家重点实验室(NWPU)(58-TZ-2011)资助
