期刊文献+

非晶硅太阳电池减反射膜的设计 被引量:5

Design of Anti-Reflection Coating for A-Si Solar Cell
下载PDF
导出
摘要 基于非晶硅太阳电池的工作原理,对其减反射膜进行研究.根据四分之一波长作用原理得到反射率最小时的厚度优化参数.单层减反射膜选用ITO(n=2.0,d=75 nm),加权平均反射率为5.91%.双层膜选用MgF2/ITO,厚度分别为111nm和75 nm,加权平均反射率为3.72%.此外,还作出反射率随波长的变化曲线,并通过计算仿真结果进行比较说明如何选材:对于单层减反射膜,采用折射率小的材料能取得更好的效果,而对于双层减反射膜,采用折射率上低下高形式,能取得更好的效果. The anti-reflection coating is researched theoretically based on the principle of the amorphous sili- con solar cell. Following the quarter-wavelength action principle, the optimized thickness parameters can be ob- tained by computing the minimal reflectivity of the anti-reflection coatings. The single-layer anti-reflection coating adopts ITO( n = 2.0, d = 75 nm) with the weighted average reflectance of 5.91% ; the double-layer anti-re- flection coating uses MgF2/ITO with the thickness of 111 nm and 75 nm, and the weighted average reflectance of 3.72%. In addition, the variation curve of reflectivity with the wavelength is put forward to explain how to select materials according to the results calculated by the computer program: as for single-layer anti-reflection coatings, the materials with a small refractive index can achieve good results, and for the double-layer anti-re- flection coatings, the materials with the low(up)/high(down) form of refractive index can get better effect.
出处 《光电技术应用》 2010年第1期41-44,共4页 Electro-Optic Technology Application
基金 安徽省自然科学基金(090412038)
关键词 非晶硅 减反射膜 反射率 amorphous silicon anti-reflection coating reflectivity
  • 相关文献

参考文献8

二级参考文献23

  • 1张德恺,胡晓云,李婷,黄亚娜,马一平,李莉莎.TiO_2纳米薄膜微观结构及光学性能研究[J].光子学报,2004,33(8):982-985. 被引量:19
  • 2张诚,卢维强,王涌天.基于宽光谱监控的光学薄膜自动控制技术[J].光子学报,2004,33(9):1136-1139. 被引量:12
  • 3孔伟金,吴福全,郝殿中,王吉明,邵建达.窄带薄膜偏光分束镜的研制及其性能测试[J].光子学报,2004,33(11):1373-1376. 被引量:14
  • 4[4]Nubile P.Analytical design of antireflection coatings for silicon photovoltaics.Thin Solid Films,1999, 342:257 被引量:1
  • 5[5]Cid M,Stem N,Brunetti C,et al.Improvements in anti-reflection coatings for high-efficiency silicon solar cells.Surface Coatings Technology,1998,106:117 被引量:1
  • 6[6]Lee S E,Choi S W,Yi J.Double-layer anti-eflection coating using MgF2 and CeO2 films on a crystalline silicon substrate. Thin Solid Films,2000,376:208 被引量:1
  • 7[8]Bouhafs D,Moussi A,Chikouche A,et al.Design and simulation of antireflection coating systems for optoelectronic devices:Application to silicon solar cells. Solar Energy Materials and Solar Cells,1998,52:79 被引量:1
  • 8Qiao Z, Latz R, Mergel D. Thickness dependence of In2O3 : Sn film growth. Thin Solid Films, 2004,466 ( 1-2) :250-258. 被引量:1
  • 9Antony A A, Nisha M, Manoj R, et al. Influence of target to substrate spacing on the properties of ITO thin films.Applied Surface Science, 2004,225 : (1-2) : 294 - 301. 被引量:1
  • 10Chopra K L, Major S, Pandya D K. Transparent conductors-A status review. Thin Solid Films, 1983,102 (1):1-46. 被引量:1

共引文献45

同被引文献24

  • 1向小龙,彭志虹,朱晓明,罗卫国,赵加宝,罗亮.应用于扩散工艺中的闭管扩散技术[J].微细加工技术,2006(6):63-64. 被引量:7
  • 2薛俊明,麦耀华,赵颖,张德坤,韩建超,侯国付,朱锋,张晓丹,耿新华.薄膜非晶硅/微晶硅叠层太阳电池的研究[J].太阳能学报,2005,26(2):166-169. 被引量:22
  • 3张世强,李万河,徐品烈.硅太阳能电池的丝网印刷技术[J].电子工业专用设备,2007,36(5):55-59. 被引量:33
  • 4Lauzuriea S, Garcia-Ballesteros J J, Colina M, et al. Selective ablation with UV lasers of a Si: H thin film solar cells in direct scribing configuration[J]. Applied Surface Science, 2011,257(12):5230-5236. 被引量:1
  • 5Molpeceres C, Lauzurica S, Urbina L. et al. Microprocessing of ITO and a-Si thin films using ns laser sources[J]. Journal of Micromechanics and Microengineering, 2005,15 : 1271-1278. 被引量:1
  • 6Yuan Z, Lou Q, Zhou J, et al. Numerical and experimental analysis on green laser crystallization of amorphous silicon thin films[J]. Optics and Laser Technology, 2009, 41 (4) : 380-383. 被引量:1
  • 7Jiang Y L, Chang Y C. Rapid crystallization of a-Si: H films with various silicon-to-hydrogen bonding configurations using rapid energy transfer annealing[J]. Thin Solid Films, 2006,500(1/2) :316-321. 被引量:1
  • 8Haas S, Gordijn A, Stiebig H. High speed laser processing for monolithical series connection of silicon thin-film modules[J]. Progress inPhotovoltaics : Research and Applications, 2008, 16(3) : 195-203. 被引量:1
  • 9Garcia-Ballesteros J J, Torres I, Lauzurica S, et al. Influence of laser scribing in the electrical properties of a-Si: H thin film photovoltaic modules[J]. Solar Energy Materials and Solar Cells, 2011, 95(3) : 986-991. 被引量:1
  • 10DEZENG LI, FUQIANG HUANG. SHANGJUN DING. Solgel preparation and characterization of nanoporous ZnO/SiO2 coatings with broadband antireflection properties[J]. Applied Surface Science, 2011, 257 (23):9752-9756. 被引量:1

引证文献5

二级引证文献21

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部