摘要
193 nm光刻胶主要有化学/非化学放大、分子玻璃和无机-有机杂化等类型。目前,商业化193 nm光刻胶基本为化学放大型,主要成分包括聚合物树脂、光致产酸剂、添加剂(碱性添加剂、溶解抑制剂等)和溶剂等。本文从光刻胶的成分出发介绍193 nm化学放大胶的研究进展,概述目前应用及研究中出现的代表性193 nm化学放大胶,总结其优缺点及未来可能的发展方向。
There are several platforms for 193 nm photoresists,including chemically/non-chemically amplified photoresists,molecular glass and inorganic-organic hybrid systems.This review mainly focueses on chemically amplified photoresists due to their predominante role in industrial applications.The main components of the 193 nm chemically amplified photoresist include polymer resins,photoacid generators,additives(alkaline additives,dissolution inhibitors,etc.)and solvents.We review the current status of representative 193 nm photoresists and their main components and their advantages,disadvantages and possible development directions are also discussed.
作者
李小欧
顾雪松
刘亚栋
季生象
LI Xiao-Ou;GU Xue-Song;LIU Ya-Dong;JI Sheng-Xiang(Huangpu Institute of Aduanced Materials,Changchun Institute of Applied Chemistry,Chinese Academy of Sciences,Guangzhou 510530,China;Key Laboratory of Polymer Ecomaterials,Changchun Institute of Applied Chemistry,Chinese Academy of Sciences,Changchun 130022,China,)
出处
《应用化学》
CAS
CSCD
北大核心
2021年第9期1105-1118,共14页
Chinese Journal of Applied Chemistry
基金
国家自然科学基金(No.51973212)
吉林省科技发展计划中青年科技创新领军人才及团队项目(No.20200301017RQ)资助。
关键词
化学放大胶
聚合物树脂
光致产酸剂
碱性添加剂
溶解抑制剂
Chemically amplified photoresist
Polymer resin
Photoacid generator
Alkaline additive
Dissolution inhibitor
