摘要
主要介绍了国内外光刻胶的发展历程及应用情况,分析了国内外光刻胶市场状况及未来走向,并在此基础上阐述了我国光刻胶今后的研发重点及未来的发展方向。
The development course and application of photoresist in China and abroad were introduced. The market status and heading direction of photoresist in China and abroad were also analyzed. The research focuses and development trends of photoresist in China were described.
出处
《精细与专用化学品》
CAS
2006年第16期24-30,共7页
Fine and Specialty Chemicals
关键词
集成电路
光刻胶
感光剂
integrated circuit
photoresist
photosensitizer
