摘要
以螯合剂与活性剂为材料,利用难溶物质微弱电离平衡、螯合剂络合机理以及活性剂的铺展、润湿以及渗透作用,结合有机物结构相似相溶原理,研制新型碱性清洗液,用于有效去除Cu-CMP后的苯并三氮唑(BTA)。通过接触角测试、电化学实验以及原子力显微镜(AFM)测试可以得出:体积分数为0.015%的FA/OⅡ螯合剂、体积分数为0.003%的FA/OⅠ螯合剂与体积分数为0.1%的FA/O活性剂组成的新型碱性清洗剂,采用清洗液体积流量为1 440 mL/min进行PVA刷洗,可以有效去除BTA,且具有较低的表面粗糙度和较高的表面耐腐蚀性。螯合剂既可以与Cu-BTA反应生成铜胺络离子去除BTA,也可作为催化剂,提高活性剂在Cu表面的铺展、润湿及渗透效果,进一步增强BTA的去除效果。
Using weak ionization equilibrium of insoluble materials, chelating agent complexation mechanism, and spreading, wetting and penetration of surfactants, combining the principle of or- ganic structure similarity and miscibility, a novel alkaline cleaning solution based on chelating agent and surfactant was prepared to effectively remove benzotriazole （BTA） after Cu-CMP. The results of the contact angle measurement, electrochemical experiment and atomic force micro- scope （AFM） test show that the novel alkaline cleaning solution composed of FA/O Ⅱ chelating agent with volume fraction of 0. 015%, FA/O I chelating agent with volume fraction of 0. 003% and FA/O surfactant with volume fraction of 0.1% can effectively remove BTA by PVA scrub when the volume flow of the cleaning solution is 1 440 mL/min, and lower surface roughness and higher surface corrosion resistance are obtained. The chelating agent not only can react with Cu-BTA to generate copper amine complex ion for BTA removal, but also can be used as catalyst to improve the spreading, wetting and penetration effects of the surfactant on Cu surface, and then further enhance the removal effect of BTA.
作者
杨柳
刘玉岭
檀柏梅
高宝红
刘宜霖
Yang Liu Liu Yuling Tan Baimei Gao Baohong Liu Yilin(School of Electronic Information Engineering, Hebei University of Technology, Tianjin 300130, China Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300130, China)
出处
《微纳电子技术》
北大核心
2017年第11期791-796,共6页
Micronanoelectronic Technology
基金
国家自然科学基金资助项目(NSFC61504037)
国家中长期科技发展规划02科技重大专项资助项目(2016ZX02301003-004-007)
河北省博士后择优资助项目(B2015003010)
