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多孔硅PL谱的影响因素分析 被引量:5

Effect of Fabrication Conditions and Aging Time on Photoluminescence of Porous Silicon
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摘要 通过阳极氧化电化学方法制备了多孔硅 ,并在室温下对不同条件下制得的多孔硅光致发光谱 (PL谱 )进行系统的分析 .结果表明 ,随着阳极电流密度、阳极化溶液浓度和时间的增大 ,多孔硅的 PL谱峰将发生“蓝移”,并且 PL峰强也显著增加 ,但过大的电流密度、阳极化溶液浓度和时间将导致 PL峰强下降 .另外 ,还发现 PL谱存在多峰结构 ,而多孔硅在空气中放置时间的延长将引起其 PL的短波峰“蓝移”和强度下降 ,但对长波峰只引起强度减弱 ,并不影响其峰位 .PL谱的多峰结构可以认为是由于样品中同时存在“树枝”状和“海绵”状两种微观结构所产生的 ,在这个假设下 。 Samples of porous silicon are fabricated by an electrochemical approach and photoluminescent properties of PS are studied systematically.It is found that,with the incresing of the current density,anodizing time and HF concentration in etching solution,the peaks of PL occures the blue shift,as well as intensity for peaks is enhanced.But excessive current density,anodizing time or HF concentration would bring the decrease of PL intensity.The results also shows that PL spectra have a multi peak structure.When PS are exposed to the air,the oxidation of PS would cause both blue shift of position and degradation of intensity for the peaks with short photoluminescent wavelength,and only cause a great deal decrease of the intensity of the long wavelength peaks.The multi peak structure of PL spectra might be interpreted by PS samples comprising two different microstructures,branched and spongy structures.The branched PS is related to the peaks at short wavelength and spongy PS is corresponded to peaks at long wavelength.And branched PS is oxidized more easily than spongy one when they are exposed to the air.All the above phenomena could be understood in the quantum confinement and luminescence center model.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第1期38-42,共5页 半导体学报(英文版)
基金 浙江省教委基金资助项目 (9812 0 3 )~~
关键词 多孔硅 光致发光光谱 波峰蓝移 半导体材料 porous silicon photoluminescent spectrum blue shift of wavelength
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