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GaAs/AlGaAs多量子阱红外探测器外延材料PL谱研究

Study on Photoluminescence Spectrum of Quantum Well Infrared Photodetector Epitaxy Structure
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摘要 结合薛定谔方程和泊松方程,模拟计算得到GaAs/AlGaAs多量子阱红外探测器外延材料能带图,并对该材料进行光致荧光谱(PL)测量。结合理论计算,由材料吸收峰位置得到势垒高度以及势阱基态位置,采用传输矩阵法得到价带与导带基态能量,并由此推算出相应的红外探测响应波长。以傅里叶变换红外光谱仪对GaAs/AlGaAs多量子阱红外探测器器件进行光谱测量,测量结果表明,所采用的计算方法得出的理论结果与器件的光电流谱吻合较好,利用光荧光谱对外延材料进行测量,可以在器件工艺前,快速确定器件的探测波长,从而更加有效地开展器件的研究。 The energy-band diagram of GaAs/AlGaAs multiple quantum well infrared photodetector(QWlP) is calculated by using Schrodinger equation and Poisson equation. The photoluminescence(PL) scan has been performed on the material of QWIP. With theoretical calculation, the peak response wavelength of QWIP is determined. The absorption measurement of the devices was performed in a fourier transform infrared spectrometer(FTIR). The calculated result shows that the theoretical result which is calculated by the proposed method is considerably coherent with the photocurrent spectrum for the same sample. The photoluminescenee(PL) scan provides a prompt way for detecting wavelength before process and it improves the development of this technology effectively.
出处 《半导体光电》 CAS CSCD 北大核心 2009年第1期55-58,共4页 Semiconductor Optoelectronics
关键词 多量子阱 红外 光致荧光谱 multiple quantum wells infrared photoluminescence(PL)
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  • 1崔丽秋,江德生,张耀辉,刘伟,吴文刚,王若帧.3~5微米双势垒量子阱红外探测器结构在不同偏压下的光伏响应[J].Journal of Semiconductors,1996,17(7):557-560. 被引量:4
  • 2Hayakawa T, Suyama T, Kondo M, et al. Improvenents in A1GaAs laser diodes grown by molecular beam epitaxy using a compositionally graded buffer layer[J]. Appl Phys Lett. 1986.49:191-193. 被引量:1
  • 3Pao Y C, Franklin J. Influence of As4/Ga flux ratio on be incorporation in heavily dooped GaAs grown by molecular beam epitaxy[J]. J Crvstal Growth, 1989, 95: 301-304. 被引量:1
  • 4Hayakawa T, Takahashi K, suyama T, et al. Effect of group Ⅴ/Ⅲ flux ratio on the reliability of GaAs/Al0.3Ga0.7As laser diodes prepared by molecular beam epitaxy[J]. Appl Phys Lett, 1988,52(4):252-254. 被引量:1
  • 5Morkoc H, Prummond T J, Fischer R. Interfacial properties of (A1, Ga)As/GaAs structures: ef-fect of substrate temperature during growth by molecular beam epitaxy[J].J Appl Phys, 1982,53(2):1030-1033. 被引量:1
  • 6Tsang W T, Reinhart F K, Ditzenberger J A. The effect of substrate temperature on the current threshold of GaAs-AlxGa1-xAs double-heterostructure lasers grown by molecular beam epitaxy[J]. Appl Phys Lett, 1980, 36(2):118-120. 被引量:1
  • 7Gunapala S D,SPIE.3379,1998年,3379期,382页 被引量:1
  • 8Chen C J,Appl Phys Lett,1997年,68卷,1446页 被引量:1
  • 9Tidrow M Z,Appl Phys Lett,1997年,70卷,859页 被引量:1
  • 10Rajavel R D,J Cryst Growth,1997年,175期,653页 被引量:1

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