摘要
研究了射频磁控溅射制备ITO薄膜,利用四探针方法、分光光度计测试薄膜面电阻及红外-可见光光谱,利用光谱特征研究了不同工艺对薄膜面电阻、载流子浓度、折射率等光电性能的影响。研究表明,随温度的升高ITO薄膜面电阻减小,载流子浓度增加,折射率减小,透过率增加;随氧分压的增加面电阻增大,载流子浓度减小。
In this article indium-tin-oxide （ITO） films were deposited on glass substrates by RF- magnetron sputtering. The sheet resistance and infrared-visible spectra were investigated using a four-point probe, spectrophotometer. In order to investigate the influences of the process parameters, the sheet resistance, carrier concentration and refractive index were analyzed by spectra characteristic. It is demonstrated that the sheet resistance and refractive index decreased while the carrier concentration and transmittance increased with the substrate temperature rises . On the other hand the sheet resistance increased and carrier concentration decreased with the oxygen partial pressure up-rises.
出处
《玻璃》
2007年第3期6-8,共3页
Glass
关键词
ITO薄膜
面电阻
载流子浓度
光谱
ITO film, Sheet resistance, Carrier concentration, Spectra
