摘要
硅光栅的制作可以利用湿法腐蚀体硅工艺 湿法腐蚀利用硅的各向异性 ,由硅的晶面形成光栅工作凹槽 ,利用湿法工艺可以制作在不同光谱波段内工作的闪耀光栅 设计了一种利用偏晶向 (111)硅片制作闪耀光栅的方法 ,使用这种方法可以批量制作闪耀角度较小的光栅 利用扫描电子显微镜 (SEM)进行了光栅表面形貌测试 ,试验结果表明 ,制作的硅光栅样片具有良好光学特性的反射表面和光栅槽形 硅闪耀光栅可以被用来制作微型光谱仪。
The bulk silicon wet etching can be used to fabricate silicon grating. Wet etching depends on anisotropic property of silicon and the facets of gratings grooves can be formed by crystal surfaces of silicon.Blazed gratings for different spectral bands can be fabricated by this process.A method to fabricate blazed gratings by using deflecting crystal orientation (111) silicon wafer is designed. The topographies of silicon gratings have been measured by SEM, the experimental results indicate that the samples have good uniformity grooves and grating facets of excellent optical quality. Silicon blazed grating can be used to fabricate mini instruments or devices, such as micro spectrometer and filter etc.
出处
《光子学报》
EI
CAS
CSCD
北大核心
2004年第6期755-757,共3页
Acta Photonica Sinica
基金
国家 973 G19990 3310 7
中国科学院知识创新工程项目资助
