摘要
传统检测方法由于测量范围小、测量时间长,不能满足在线、在机和大幅面的检测需求,本文提出了一种白光扫描干涉和原子力显微测量相结合的芯片表面形貌测量方法。在分析了白光扫描干涉测量技术和原子力显微测量技术特点的基础上,构建了两种方法互补的测量方案:首先采用白光扫描干涉测量技术对芯片进行大范围快速扫描,再通过原子力显微测量技术对关键区域进行精细扫描检测。基于此进行了测量系统的硬件设计与集成,测试结果表明,该系统能够在毫米级检测范围内实现纳米级表面形貌的精确测量。
Because of the small measurement range and long measurement time, the traditional detection methods can not meet the requirements of on-line, in-machine and large-format detection. In this paper, a chip surface morphology measurement method combining white light scanning interferometry and atomic force microscopy is presented. Based on the analysis of the characteristics of white light scanning interferometry and atomic force microscopy, a measurement scheme with two complementary methods was constructed. Firstly, the white light scanning interferometry was used to scan and inspect the chip in a large range with a high speed, and then the atomic force microscopy was used to measure the key areas by fine scanning. The measurement system was designed and integrated. The testing results showed that the system can accurately detect the nano-scale surface morphology in a range of millimeter.
作者
夏承晟
邓惠文
赵书浩
陶伟灏
张国锋
杨树明
XIA Chengsheng;DENG Huiwen;ZHAO Shuhao;TAO Weihao;ZHANG Guofeng;YANG Shuming(State Key Laboratory for Manufacturing Systems Engineering,Xi'an Jiaotong University,Xi'an 710049,China)
出处
《计测技术》
2023年第1期137-142,共6页
Metrology & Measurement Technology
基金
国家自然科学基金(52225507)。
关键词
芯片
表面形貌测量
白光干涉
原子力显微镜
chip
surface morphology measurement
white light interferometry
atomic force microscope
