摘要
原子力显微镜(AFM)是评价亚纳米级表面粗糙度σRMS最主要的测试仪器,但其测试结果会因采样条件(采样间距、采样点数)及测量点位置变化而改变。以AFM测试超光滑光学基底随机表面为例,应用累积功率谱理论建立了确定合理采样条件的方法,避免了采样条件选取不当带来的数据丢失或冗余;通过全局优化选取测量点和局部优化选取测量点相结合,降低了样品表面区域性差异给测试结果带来的不确定性,并大大减少了获得可靠测试结果所需的测试量。上述工作为超光滑光学基底AFM测试提供了有效方案。
Atomic force microscopy （AFM） is the main technique for measuring surfaces of sub-nanometer rootmean-square roughness, but its results always vary with the sampling conditions （sampling interval and sampling points） and measuring position. As a practical example of a supersmooth substrate random surface, an effective method based on accumulated power spectral analysis is proposed and evaluated for appropriate sampling term selecting. It is shown that this method can avoid the loss or redundancy of roughness information. A optimized measuring position selection strategy according to global and local topography analysis is proposed. It can reduce the uncertainties in surface roughness characterization due to characteristic differences of different local surfaces and the required number of measurements to obtain reliable results. The above researches provide an effective method for testing optical supersmooth substrate surface by atomic force microscopy.
出处
《中国激光》
EI
CAS
CSCD
北大核心
2011年第11期235-240,共6页
Chinese Journal of Lasers
基金
国家重大科技专项资助课题
关键词
测量
原子力显微镜
超光滑基底
均方根粗糙度
采样条件
选点方案
measurement
atomic force microscopy
supersmooth substrate
root-mean-square roughness
sampling conditions
measuring position selection strategy
