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用于表面形貌测量的扫描白光干涉技术进展 被引量:4

Advances in Scanning White Light Interferometry for Surface Topography Measurement
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摘要 扫描白光干涉术是目前最精确的表面形貌测量技术之一,被广泛应用于工业与科研领域。从发明至今的三十余年间,在精密光学、半导体、汽车及航天等先进制造领域的需求牵引下,该技术不断取得新的进展与突破。本文从技术应用、方法和算法创新、系统设计、理论模型、校准与误差补偿等方面,总结了过去二十年扫描白光干涉技术的重要进展,对该领域进一步发展提出了展望。 Scanning white light interferometry is one of the most accurate surface topography measurement techniques.It is widely used in various industrial and scientific research fields.Since its invention more than thirty years ago,the progress and breakthroughs of this technique have been continuously made,driven by the demands of advanced manufacturing sectors such as precision optics,semiconductors,automotive and aerospace.This paper summarizes the important progress of scanning white light interferometry in the past two decades from the aspects of its applications,new measurement methods and algorithms,system designs,theoretical modeling,calibration and error compensation,and puts forward the prospect of further development in this field.
作者 苏榕 刘嘉宇 乔潇悦 简振雄 张政 温荣贤 陈成 任明俊 朱利民 Su Rong;Liu Jiayu;Qiao Xiaoyue;Jian Zhenxiong;Zhang Zheng;Wen Rongxian;Chen Cheng;Ren Mingjun;Zhu Limin(Precision Optical Manufacturing and Testing Center,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;School of Mechanical Engineering,Shanghai Jiao Tong University,Shanghai 200240,China;China Russia Belt and Road Joint Laboratory on Laser Science,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;School of Optical Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai 200093,China)
出处 《激光与光电子学进展》 CSCD 北大核心 2023年第3期60-80,共21页 Laser & Optoelectronics Progress
基金 科技部国家重点研发计划(2022YFE0204800) 中国科学院国际伙伴计划项目(181231KYSB20200040) 国家自然科学基金(62105204) 上海市高新技术领域项目(22511102103)。
关键词 测量 白光干涉术 表面形貌 计量学 光学成像 干涉显微术 先进制造 measurement white light interferometry surface topography metrology optical imaging interference microscopy advanced manufacturing
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