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ENEPIG在倒装芯片用陶瓷外壳中的应用可行性 被引量:3

Application Feasibility of ENEPIG in Ceramic Package for Flip Chip
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摘要 目前倒装芯片用陶瓷外壳的表面处理工艺以化学镀镍/浸金(ENIG)为主,而ENIG带来的黑盘现象使封装产品面临润湿不良和焊接强度不足等一系列问题。化学镀镍/化学镀钯/浸金(ENEPIG)是ENIG的一种改进方案,可有效避免黑盘现象。对分别采用ENIG和ENEPIG镀层的陶瓷外壳样品在外观、微观形貌以及焊接强度等方面进行了对比,采用ENEPIG镀层样品的表现优于采用ENIG镀层的样品。对采用ENEPIG镀层的外壳样品进行了芯片贴装,并进行了热冲击、温度循环等一系列试验,试验合格率100%,说明该方案可以满足器件级鉴定检验要求。验证结果表明,ENEPIG在高密度陶瓷封装领域具有良好的应用前景。 At present,electroless nickel/immersion gold(ENIG)is the main surface finish process for flip chip ceramic package,but the"black pad"caused by ENIG makes the packages facing series problems such as poor wetting and insufficient soldering strength.Electroless nickel/electroless palladium/immersion gold(ENEPIG)is an improved solution of ENIG,which can effectively avoid"black pad".Ceramic packages with ENIG and ENEPIG plating were compared in terms of appearance,micromorphology and soldering strength.It is found that the samples with ENEPIG plating perform better than the samples with ENIG plating.Chips were mounted on the packges with ENEPIG plating,and a series of tests such as thermal shock and temperature cycling were carried out.The test pass rate is 100%,which indicates that ENEPIG can meet the requirements of device level identification and inspection.The verification results show that ENEPIG has a good application prospect in the field of high density ceramic packaging.
作者 张崤君 李含 Zhang Xiaojun;Li Han(The 13th Research Institute,CETC,Shijiazhuang 050051,China)
出处 《半导体技术》 CAS 北大核心 2020年第6期484-488,共5页 Semiconductor Technology
关键词 化学镀镍/浸金(ENIG) 化学镀镍/化学镀钯/浸金(ENEPIG) 高密度陶瓷外壳 表面处理 焊接可靠性 electroless nickel/immersion gold(ENIG) electroless nickel/electroless palladium/immersion gold(ENEPIG) high density ceramic package surface finish soldering reliability
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  • 1史筱超,崔艳娜,贺岩峰,郁祖湛.化学镀镍金层可焊性的影响因素[J].印制电路信息,2006,14(4):40-43. 被引量:9
  • 2中国电子学会电子封装专业委员会电子封装丛书编辑委员会.微电子陶瓷封装手册[Z].北京:电子工业出版社,2001.527. 被引量:1
  • 3ZENG K J, STIERMAN R, ABBOTT D, et al. Root cause of black pad failure of solder joints with electroless nickel/ immersion gold plating [ C]//Proc of ITHERM'06. San Diego, CA,2006:1111-1119. 被引量:1
  • 4JOHAL K, BREWER J. Are you in control of your electroless nickel/immersion gold process [ C ] // Proc of IPC Works Conf. Miami, USA, 2000. 被引量:1
  • 5BIUNNO N. A root cause failure mechanism for solder joint integrity of electroless nickel/immersion gold surface finishes [C]//Proc of Surface Mount Technology International Conf. San Jose, USA, 1999:561-568. 被引量:1
  • 6COYLE R J, POPPS D E H, MAWER A, et al. The effect of modifications to the nickel/gold surface finish on assembly quality and attachment reliability of a plastic ball grid array [ J ]. Component Package Technology, 2003,26 (4) : 724-732. 被引量:1
  • 7白蓉生.化镍浸金焊接黑垫之探究与改善.电路板会刊,2002,(15):1-27. 被引量:2
  • 8JAY R, KWONG A. Dealing with the black pad defect-a failure analysis' s perspective [ C ]// Proc of SMTA Int Conf. Chicago, USA, 2002 : 53-59. 被引量:1
  • 9杨维生.化学镀镍金新工艺技术在印制板中的应用.微电子与基础产品,:55-58. 被引量:1
  • 10OsterwinterH.化学镀镍/金层表面的线焊性.Galvanotechnik,:205-205. 被引量:1

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