摘要
采用磁控溅射法在Mo衬底上制备了不同负偏压的Ru薄膜,利用XRD、台阶仪、XPS、AFM、纳米划痕仪和电化学工作站对薄膜相结构、表面形貌、膜基结合力以及腐蚀电化学性能进行了研究.结果表明：当负偏压在0~100 V时,薄膜六方结构（hcp）,具有（002）择优取向.随负偏压的升高,薄膜中出现面心立方（fcc）Ru O2相,此时薄膜两相共存,即hcp-Ru＋fcc-Ru O2.薄膜表面粗糙度随负偏压的升高先降低后升高,当负偏压为100 V时,薄膜表面粗糙度最低,其最低值为0.639 nm.薄膜的膜基结合力及在3.5%Na Cl溶液中的耐蚀性能先升高后降低,当负偏压为100 V时,膜基结合力及耐蚀性能最佳.
Ru films were prepared with various negative bias on the Mo substrate deposited by magnetron sputtering,and the microstructure,adhesion strength and corrosion resistance were investigated by XRD,step profiler,XPS,AFM,nano-scratch and electrochemical work station. The results showed that Ru films exhibited a single hcp structure with（ 002） preferential orientation when the negative bias was in the range between 0 and 100 V.With a further increase in the negative bias,fcc- Ru O2 phase was detected in the films,indicating that a two-phase structure,consisting of fcc- Ru O2 and hcp- Ru,co- existed in the films. The roughness of the films initially decreased and reached a summit,then increased with the increasing of negative bias and the minimum value was 0. 639 nm when the negative bias was 100 V. The adhesion strength and corrosion resistance of the films first increased and then decreased with the increase of negative bias. When the negative bias was 100 V,the optimum adhesion strength and corrosion resistance of the films was detected.
出处
《江苏科技大学学报（自然科学版）》
CAS
北大核心
2016年第5期430-434,共5页
Journal of Jiangsu University of Science and Technology:Natural Science Edition
基金
江苏省产学研前瞻性课题研究基金资助项目(BY2013066-11)
关键词
磁控溅射
Ru薄膜
负偏压
耐蚀性能
magnetron sputtering
Ru films
negative bias
corrosion resistance property
