摘要
采用射频磁控溅射制备了不同Ta含量的Cr-Ta-N薄膜,利用扫描电子显微镜(SEM)、能谱仪(EDS)、X射线衍射仪(XRD)、纳米压痕仪、摩擦磨损仪和三维形貌仪等设备对薄膜的成分、微观结构、力学和室温摩擦磨损性能进行表征.结果表明,Cr-Ta-N薄膜呈面心立方(fcc)结构,为Ta固溶在Cr N晶格中的置换固溶体.随着Ta含量的升高,Cr-Ta-N薄膜的硬度先逐渐升高后基本趋于稳定.当Ta质量百分含量增加到1.74%时,Cr-Ta-N复合膜的硬度最大,达到31.9GPa.在室温条件下,Cr-Ta-N薄膜的平均摩擦系数和磨损率随Ta含量的升高逐渐减小.当薄膜中Ta质量百分含量为3.37%,薄膜平均摩擦系数以及磨损率最小,其最小值分别为0.52、1.77×10^(-8)mm^3·N^(-1)·mm^(-1).
Cr-Ta-N films with various Ta contents were deposited by the reactive magnetron sputtering and the elemental compositions,microstructure,mechanical and tribological properties were investigated by scanning electron microscope(SEM),energy disperse spectroscopy(EDS),X-ray diffraction(XRD),nano-indentation,wear tester and 3D profilometer.The results showed that substitutional solid solution of Cr-Ta-N was formed by substitution of Cr in CrN lattice by Ta and all films exhibited a single-phase face-centered cubic(fcc)structure.With the increase of Ta content in the films,the hardness of the films first increased and then remained stable and the maximum value is 31.9 GPa,at 1.74.%Ta.The average friction coefficient and wear rate at room temperature decreased gradually with the increasing Ta content in the films and the minimum values were 0.52 and 1.77×10-8 mm 3·N-1·mm-1,respectively,at 3.37%Ta.
作者
边建国
许俊华
BIAN Jianguo;XU Junhua(School of Materials Science and Engineering,Jiangsu University of Science and Technology,Zhenjiang 212003,China)
出处
《江苏科技大学学报（自然科学版）》
CAS
2018年第1期31-35,45,共6页
Journal of Jiangsu University of Science and Technology:Natural Science Edition
基金
国家自然科学基金资助项目(51574131)
国家自然科学基金资助项目(51374115)
