摘要
采用非平衡磁控溅射法制备不同V含量的ZrVCN复合薄膜,利用能谱分析、X射线衍射以及纳米压痕仪与摩擦磨损仪等研究V含量对薄膜的成分、微结构、硬度与摩擦性能的影响。结果表明,ZrVCN复合膜呈现fcc结构,V的加入使薄膜衍射峰升高并变得尖锐,随V含量增加衍射峰向大角度方向偏移。随V含量增加,薄膜硬度先增加后降低,V与Zr的原子比n(V)/n(Zr)为0.31的薄膜硬度最高,为33.1 GPa。薄膜的室温摩擦性能和700℃下的摩擦性能均随V含量增加而提高。n(V)/n(Zr)为0.69的ZrVCN薄膜在具有高硬度(26.3 GPa)的同时兼具良好的室温和高温摩擦性能,其室温和700℃高温下的摩擦因数分别为0.40和0.48。
ZrVCN thin films with different V contents were deposited by reactive unbalanced magnetron sputtering, their microstructure, mechanical and tribological properties were investigated by XRD, nanoindentation and tribometer. The results indicate that ZrVCN thin films have a fcc crystal structure and the intensities of diffraction peaks become more higher and sharper after V addition. With increasing V content, the hardness of ZrVCN thin films increases at first then decreases rapidly. The hardness of ZrVCN thin film achieves the maximum value of 33.1 GPa when V/Zr is 0.31. The friction coefficient of the films increases with increasing V content at room temperature. And the friction coefficient of the films decreases with increasing V content at 700℃. Finally the ZrVCN film with V/Zr ratio of 0.69 has both high hardness and excellent trbological properties.
出处
《粉末冶金材料科学与工程》
EI
北大核心
2013年第6期869-873,共5页
Materials Science and Engineering of Powder Metallurgy
基金
国家自然科学基金资助项目(51074080)
江苏省自然科学基金资助项目(BK2008240)
