摘要
利用微波等离子体化学气相沉积法,以甲烷、氢气和氩气作为工作气体,在较低的沉积温度下,沉积得到了连续的金刚石薄膜。利用扫描电子显微镜、X射线衍射仪、拉曼光谱仪分别对金刚石薄膜的表面形貌、生长结构以及沉积质量进行了表征。实验结果表明,氩气的引入虽然可以有效的降低获得金刚石薄膜所需的基片温度,但为了提高金刚石薄膜的质量,需要适当的提高微波功率。同时,当基片温度一定时,在CH4/H2/Ar体系和CH4/H2体系下均可获得表面形貌与生长结构相似的金刚石薄膜,且可能利用CH4/H2/Ar作为工作气体沉积金刚石薄膜所需要的微波功率更低。
CVD diamond films have been prepared by MPCVD technology using the mixture gas of CH4,H2 and Ar at relative low substrate temperature. Scanning electron microscope,X- ray diffraction and Raman spectrum have been used to evaluate the surface morphology,growth structure and quality of the deposited diamond films. The results show that introducing Ar can reduce the substrate temperature effectively for the deposition of CVD diamond film. However,the increase of microwave power is necessary to improve the quality of diamond film. Meanwhile,the diamond films with similar surface morphology can be obtained at CH4/H2/Ar and CH4/H2,respectively when the substrate temperature is kept constant. And the microwave power used for the deposition of diamond films with CH4/H2/Ar maybe lower.
出处
《真空与低温》
2016年第5期291-295,共5页
Vacuum and Cryogenics
基金
湖北省教育厅科学技术研究计划优秀中青年人才项目(No.Q20151517)
武汉工程大学科学研究基金项目(No.K201506)
