摘要
应用微波等离子体化学气相沉积（MPCVD）技术,以CH4/H2/Ar为主要气源,成功制备出了微/纳米双层金刚石膜。同时,在纳米膜层生长过程中,通过添加O2辅助气体,研究了不同O2流量对微/纳米金刚石膜生长的影响。结果表明,当O2流量在0-0.8 sccm范围时,所获得的金刚石膜仍为微/纳米两层膜结构;当氧气流量增加到1.2 sccm时,金刚石膜只有一层微米膜结构;而O2流量在0-1.2 sccm范围时,纳米层晶粒尺寸及品质与氧气流量成正比例关系。表明适量引入O2可以促进纳米层晶粒长大和提高膜品质。另外,当O2流量为0.8 sccm,所制备的微/纳米金刚石膜不仅品质好,而且生长率也较高。
Micro /nanometer diamond films were prepared by microwave plasma chemical vapor deposition（ MPCVD） using CH4/H2/Ar as main gas. The effects of different O2 flow rate on the growth of the micro /nano-diamond films were investigated. The results show that the micro-nano dual layer diamond films are still obtained when the flow rate of O2 is ranging from 0 to 0. 8 sccm; But only a layer of micrometer membrane structure is deposited when the flow rate of O2 is increased to 1. 2 sccm; However,the grain size and quality of nano-diamond layer is proportional to the oxygen flow in the range of 0 to 1.2 sccm,what indicates that the addition of moderate O2 can increase the grain size of nano-diamond layer and improve the quality of nano-diamond layer. On the other hand,when the flow rate of O2 is 0. 8 sccm,the dual micro /nanometer layer diamond films put up not only good quality,but also growth high rate.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2014年第10期2630-2634,共5页
Journal of Synthetic Crystals
基金
国家自然科学基金(11175137)
