摘要
对当前的第三代半导体材料的基本特性及应用领域进行研究,报告了Si C和Ga N材料的应用现状和发展趋势,并对其制造工艺进行了简要阐述。
The characteristics and field of application of the third generation semiconductor materials was studied. The present situation of application and market growing trends on Si C and Ga N was introduced separately. At last,manufacturing process of Si C and Ga N was analyzed briefly.
出处
《电子工业专用设备》
2016年第1期1-9,14,共10页
Equipment for Electronic Products Manufacturing
关键词
半导体材料
碳化硅
氮化镓
制造工艺
Semiconductor materials
Si C
Ga N
Manufacturing process
