摘要
类金刚石膜具有硬度高、摩擦系数低、耐腐性强、稳定性高等优点,是提高铜耐腐性的理想材料,但铜与类金刚石膜之间的结合力差。通过制备TixCy过渡层,采用磁控溅射物理气相沉积与化学气相沉积法,通过改变过渡层碳靶功率成功在铜基体上沉积类金刚石膜。并对金刚石膜进行拉曼光谱测试、划痕实验和电化学实验分析。结果表明,所制备碳膜具有典型的类金刚石结构,膜与基体之间的结合强度大,过渡层碳靶溅射功率为200 W时所制备的类金刚石膜对铜基体的保护作用最好。
Diamond-like carbon （DLC） films have good properties, such as high hardness, low friction coefficient, high stability, and so on, which make it the ideal material for copper corrosion-resistance. But, the coherence between film and copper substrate was bad. Thus, we make Ti, Cy intermediate layer to resolve this problem. DLC films were successfully grown on copper substrate by changing C target power of intermediate layer ,combining magneto-sputtering physical vapor deposition with chemical vapor deposition. Ranman spectroscopy result indicated that the films show an amorphous structure and typical characteristics of DLC films. The coherence between film and copper substrate was analyzed by Indentation method, which indicate the tight coherence. Finally, the influence of DLC film corrosion-resistance by changing C target power was analyzed by electrochemical experiments.
出处
《石油化工高等学校学报》
CAS
2015年第3期91-96,共6页
Journal of Petrochemical Universities
基金
国家海洋腐蚀防护工程技术研究中心资助(2011FU125X13)
关键词
铜基体
类金刚石膜
拉曼光谱
划痕法
耐腐蚀性
Copper substrate
Diamond-like carbon film
Ranman spectroscopy
Indentation method
Corrosion-resistance
