摘要
采用直流磁控溅射的方法在不同工艺参数(气压和功率)下制备出不同性质的类金刚石(DLC)薄膜,并利用拉曼光谱对其进行表征.实验结果表明工作气压对DLC薄膜性质的影响非常显著,而溅射功率对其的影响较小.功率在100 W下制备的DLC薄膜,I(D)/I(G)值从1.4减小到0.7随着气压从0.3 Pa增加到3 Pa;气压在0.3 Pa下制备的DLC薄膜,I(D)/I(G)值随着功率从30 W增加到300 W只有略微的增加.这是因为气压的升高会增加溅射出来的碳粒子与气体之间的碰撞次数,经过多次的碰撞会随碳粒子的尺寸进一步减小,从而得到更为无序的DLC薄膜;而功率影响的主要是溅射率,对DLC薄膜的溅射过程影响很小.DLC薄膜的I(D)/I(G)值随着薄膜厚度的增加先减小后增加,这是受基底界面和基底温度共同影响所导致的.
Series of diamond-like carbon（DLC） films are prepared by DC magnetron sputtering under different process parameters（pressure and power）.Raman spectroscopy research on DLC films shows that work pressure impact on the properties of the DLC films significantly,and sputtering power has little affect its properties.I（D） / I（G） value decreases from 1.4（0.3 Pa） to 0.7（3 Pa） with working pressure increased from 0.3 Pa to 3 Pa under 100W,but increases slightly with power from 30 W to 300 W at 0.3 Pa.The disordered carbons of DLC films increase due to the increase in pressure will increase the number of collisions between the sputtered carbon particles and the gas.Power mainly affect the sputtering rate,the sputtering process of the DLC film has little effect.The characters of the DLC films change with thickness,and I（D） / I（G） value decreases with increasing film thickness,then increases with the thickness.This is mainly caused by the combined effect of the interface with substrate and the temperature of the substrate.
出处
《首都师范大学学报（自然科学版）》
2013年第6期7-11,21,共6页
Journal of Capital Normal University：Natural Science Edition
