摘要
介绍了HF稀溶液在DGQ系列清洗工艺中对硅片表面的作用,无论是常规的酸碱清洗还是DGQ系列清洗剂的清洗,在没有HF稀溶液浸泡的情况下,1108波数处的吸收都是不同价态硅氧化物的复合吸收,用HF稀溶液浸泡后清洗的硅片,复合吸收变成仅有二氧化硅的吸收。
This paper reports the function of HF solution in DGQ series cleaning techniquefor the silicon surface.Whether it is cleaned by ordinary acid and alkali,or by DGQ series cleaningagent,under a lack of dipping silicon wafer in HF solution,the absorbability of wavenumber1108cm-1 is complex absorbability of differ value state silicon oxide,after dipping silicon waferin HF solution,the complex absorbability turned to absorbability of SiO2 only.
出处
《半导体技术》
CAS
CSCD
北大核心
2002年第7期23-25,共3页
Semiconductor Technology
基金
山东省自然科学基金资助项目
