摘要
采用多弧离子镀设备在抛光后的高速钢表面沉积TiN薄膜,在其他参数不变的情况下,着重考察偏压对薄膜的沉积速率的影响。实验结果表明,随着负偏压的增加,沉积速率不断增加,但在负偏压达到一定值后,沉积速率又随偏压增大而减小。
TiN films were deposited on polished HSS substrates by arc ion plating（AIP）. The influence of biases on the deposition rate was focused on while keeping other parameters constant. The results show that the deposition rate initially increases with increasing bias. After reaching a maximum value, the deposition rate decreases as the bias is further increased.
出处
《真空》
CAS
2013年第1期20-22,共3页
Vacuum
基金
天津师范大学推进计划项目(52X09038)资助
