摘要
AlN薄膜是宽带隙绝缘材料,在热、电、光和机械等方面具有非常良好的综合性能。本文对近些年来AlN薄膜的制备方法和性能研究作了简要的回顾介绍。
AlN thin films is a wide band gap nonconductive material and it has a lot of excellent physical properties in thermal,electrical,light and machine fields.The deposition techniques and the research on performance in recent years are briefly introduced in this paper.Then the actual application and the future status of AlN thin films are recounted in this paper.
出处
《山东陶瓷》
CAS
2005年第1期17-21,共5页
Shandong Ceramics
基金
南京航空航天大学科研启动资金
关键词
ALN薄膜
制备方法
性能
应用
AlN Thin Films
Deposition Techniques
Performance
Application
