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增强型等离子化学气象沉积炉均匀布气研究 被引量:4

Research on Uniform Airflow of Plasma Enhanced Chemical Vapor Deposition
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摘要 研究感应式射频等离子体技术,为提高离化率,利用流体力学的相关数值计算方法,对增强型等离子化学气象沉积(Plasma Enhanced Chemical Vapor Deposition,PECVD)设备的布气系统进行理论分析,得到平板布气装置中压力与孔径的关系。为了实现根据PECVD设备最大面积的均匀性布气,根据PECVD设备中的压力分布,优化现有的布气装置结构参数,以实现孔径补偿气流的效果。并结合专用的CFD软件对上述不同结构中的气流进行仿真,验证所优化的布气装置的合理性。用到现有的设备当中测试,提高了装备的均匀布气效果。 The hydrodynamics theories and related numeral algorithm are used to make theoretical analysis of the gas pressure distribution in gas distribution system of PECVD, and the relationship between the pressures and the diameters of the holes was derived. In order to achieve the maximum area of uniform gas distribution and the different gas pressure distribution, the structural parameters were optimized to make a comprehensive flow in this paper. With the help of CFD software, the gas distributions simulations were described and the best device to homogenize the gas distribution was proved. This device was manufactured and which improves the gas distribution in the real equipment.
出处 《计算机仿真》 CSCD 北大核心 2010年第6期122-125,共4页 Computer Simulation
关键词 匀流板 流体力学 仿真 均匀布气 Equi - fluid plate Hydrodynamics Simulation Uniform gas distribution
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参考文献9

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