摘要
为了制备均匀的CVD铝化物涂层,应保证沉积室内前驱气体的流场分布的均匀性。采用计算流体力学方法对沉积室内的前驱流体流场进行了仿真研究,对比了装备A、B、C型3种布风装置的CVD沉积室内流场的变化;对比了将初始进气口平均流速v经验提升至其1.5,2.0,2.5,5.0倍后沉积室内流场的变化。结果表明:选择B型布风装置能令前驱气体均匀地从进气口流向沉积室内部,且被充分加热;前驱体的最大流速v_(max)在2.0 v经验≤v_(max)<2.5 v经验时可保证气流分布、温度分布的均匀性。利用此结果,指导设计了CVD沉积室的布风装置,同时探讨了提升前驱体流速对气体流场均匀性的影响。
For preparing the uniform CVD aluminide coating,the flow field distribution uniformity of precursor gas in the deposition chamber ought to be controlled.In this work,the computational fluid dynamics(CFD)method was applied to conduct analogue simulation on the precursor fluid flow field in the deposition chamber.The flow field distribution transformations of the CVD deposition chamber equipped with the A,B,and C gas distribution devices were compared.In addition,the flow field distribution transformations of the deposition chambers were compared when the inlet velocity was raised 1.5 times,2 times,2.5 times and 5 times of the empirical velocity(ve),respectively.Results showed that choosing the B gas distribution device could ensure precursor gas uniformly to flow from gas port to the chamber and to be heated fully.When the maximum velocity of precursor was in the range of 2.0 ve~2.5 ve,the uniformity of the precursor gas flow field and temperature distribution in the deposition chamber were effectively obtained.Furthermore,the gas distribution device of CVD deposition chamber was designed under the guidance of this result,and the influences on gas flow field uniformity with raising the velocity of precursor gas were discussed.
作者
张博闻
吴勇
杨甫
黄天纵
孟施旭
赵智鑫
ZHANG Bo-wen;WU Yong;YANG Fu;HUANG Tian-zong;MENG Shi-xu;ZHAO Zhi-xin(Wuhan Research Institute of Materials Protection,Wuhan 430030,China;State Key Laboratory of Special Surface Protection Materials and Application Technology,Wuhan 430030,China;School of Materials Science and Engineering,Wuhan University of Technology,Wuhan 430070,China)
出处
《材料保护》
CAS
CSCD
2021年第5期1-6,共6页
Materials Protection
基金
国家重点研发计划“细长孔零件化学气相沉积涂覆关键技术示范应用”(2020YFB2010400)资助。
关键词
CVD
铝化物涂层
计算流体力学
仿真设计
CVD
aluminide coating
computational fluid dynamics
analogue design
