摘要
介绍了阳极真空电弧镀膜方法的镀膜装置、工作原理及电弧等离子体微观过程。就其应用前景进行了展望。
The typical equipment,the basic principle and arc plasma process of anodic vacuum arc coating are presented.Some outview upon the application of this new method are also discussed.
出处
《真空与低温》
1997年第4期228-231,共4页
Vacuum and Cryogenics