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采用DDSOG工艺加工Z轴微机械陀螺仪实验 被引量:3

Fabrication of Z-axis micromachined gyroscope with DDSOG process
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摘要 从理论上分析了Z轴微机械陀螺仪结构的工作机理,比较了体硅薄片融解工艺和DDSOG工艺的优缺点.介绍了采用DDSOG工艺加工的Z轴微机械振动陀螺的特点,并与采用体硅薄片融解工艺加工的相同Z轴微机械振动陀螺进行了残余应力、品质因数及灵敏度等性能参数的比较,采用DDSOG工艺后陀螺的驱动品质因数是原来体硅薄片融解工艺的1.45倍,而检测品质因数是原来的0.11倍.最后,比较了采用2种不同工艺加工后Z轴微机械陀螺的实验结果,结果表明采用DDSOG工艺加工后陀螺的灵敏度比原来采用体硅薄片融解工艺加工的陀螺的灵敏度提高了近10倍. A Z-axis micromachined gyroscope is proposed. Its operating principle is analyzed in theory. The advantage and disadvantage between bulk silicon dissolved wafer process and DDSOG ( deeply dissolved silicon on glass) process are compared. The characteristic of Z-axis micromachined gyroscope from DDSOG process is introduced. The Z-axis micromachined gyroscopes from DDSOG process and bulk silicon dissolved wafer process are compared in residual stress, quality factor and sensitivity. By calculation, the drive quality factor of the gyroscope from DDOSG process is 1.45 times of that from bulk silicon dissolved wafer process, but the sense quality factor of the former is only 0. 11 times of the latter. Finally the experiment results of both kinds of gyroscope are compared and it is indicated that the sensitivity of the gyroscope from DDSOG process is about ten times greater than that from bulk silicon dissolved wafer process.
作者 何晓磊 苏岩
出处 《东南大学学报(自然科学版)》 EI CAS CSCD 北大核心 2005年第4期545-548,共4页 Journal of Southeast University:Natural Science Edition
关键词 体硅薄片融解工艺 DDSOG 灵敏度 微机械陀螺仪 bulk silicon dissolved wafer process DDSOG sensitivity micromachined gyroscope
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  • 1姚雅红,高钟毓,吕苗,赵永军,赵彦军.采用薄片溶解工艺制造微机械惯性仪表的实验研究[J].清华大学学报(自然科学版),1998,38(11):12-15. 被引量:7
  • 2王寿荣编著..硅微型惯性器件理论及应用[M].南京:东南大学出版社,2000:178.
  • 3郝一龙,张立宪,李婷,张大成.硅基MEMS技术[J].机械强度,2001,23(4):523-526. 被引量:18
  • 4Freed M, Kruger M V P, Poolla K,et al. Wafer-grown heat flux sensor arrays for plasma etch processes[J]. IEEE Transactions on Semiconductor Manufacturing, 2005, 18(1):148-162. 被引量:1
  • 5Hao Y L, Zhang D C. Silicon-based MEMS process and standardization[J]. Solid-State and Integrated Circuits Technology, 2004, 3(18-21):1835-1838. 被引量:1
  • 6姚雅红,赵永军,吕苗,皮舜,李江,赵颜军.采用CCl_2F_2/O_2的高深宽比硅槽的刻蚀[J].Journal of Semiconductors,1998,19(7):542-547. 被引量:4
  • 7Lee K B, Lin L. Surface micromachined glass and polysilicon microchannels using MUMPs for bioMEMS applications[J]. Sensors and Actuators A, 2004, 111:44-50. 被引量:1
  • 8Gao D, Wijesundara M B J, Carraro C, et al. Recent progress toward a manufacturable polycrystalline SiC surface micromachining technology[J]. IEEE Sensors Journal, 2004, 4(4): 441-448. 被引量:1
  • 9裘安萍..硅微型机械振动陀螺仪结构设计技术研究[D].东南大学,2001:

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