摘要
以透明导电玻璃(TCO)、纳米TiO2TCO、CNTs TCO、铜片分别为工作电极,用简单铜盐通过阴极还原制备了Cu2O薄膜,并研究了溶液温度和衬底对电化学沉积Cu2O薄膜形貌的影响。结果表明:以TCO和铜片为衬底时,由于表面微粒为微米级,不管溶液温度高低,只能得到微米级的Cu2O薄膜;以纳米TiO2TCO和CNTs TCO为衬底,池温高于30℃只能得到微米级的Cu2O薄膜,而池温降到0℃时,都可得到纳米Cu2O。
Cu2O thin films were respectively prepared on TCO glass, nanocrystalline TiO2/TCO， CNTs/TCO and Cu substrate by cathodic electrodeposition. Effects of bath temperature and substrate on surface morphology of electrodeposited CUE O thin films were investigated. The results show that micron sized Cu2O films are deposited at different bath temperature on TCO glass and Cu substrate due to micron-sized particle on such substrates, but on TiO2/TCO and CNTs/TCO substrate, micron sized Cu2O films are prepared at bath temperature higher than 30℃ and nano-sized Cu2O are prepared at 0℃。
出处
《材料科学与工程学报》
CAS
CSCD
北大核心
2005年第4期570-573,共4页
Journal of Materials Science and Engineering
基金
国家自然科学基金资助项目(20207002)
武汉市重大科技攻关项目之纳米专项资助项目(20041003068_09)
关键词
氧化亚铜
电沉积
溶液温度
衬底
cuprous oxide
electrodeposition
bath temperature
substrate
