摘要
利用直流 射频 等离子体增强化学气相沉积技术在单晶硅表面制备了类金刚石薄膜 ,采用原子力显微镜、Raman光谱、x射线光电子能谱、红外光谱和纳米压痕仪考察了射频功率对类金刚石薄膜表面形貌、微观结构、硬度和弹性模量的影响 .结果表明 ,制备的薄膜具有典型的含H类金刚石结构特征 ,薄膜致密均匀 ,表面粗糙度很小 .随着射频功率的升高 ,薄膜中成键H的含量逐渐降低 ,而薄膜的sp3含量、硬度以及弹性模量先升高 ,后降低 ,并在射频功率为 10 0W时达到最大 .
Diamond-like carbon (DLC) films were deposited on Si substrates by a dual direct current and radio frequency plasma-enhanced chemical vapor deposition (DC-RF-PECVD) technique. The effect of RF power on the surface morphology, microstructure, hardness and Young's modulus of DLC films was investigated by atomic force microscopy, Raman spectroscopy, x-ray photoelectron spectrometry, infrared spectroscopy and nano-indentation. The films produced by DC-RF-PECVD have typical hydrogenated diamond-like characteristics, and the surface of the films was smooth and compact. With the increase of RF power the bonded hydrogen content in the films decreased while the sp(3) content, hardness and Young's modulus of the DLC films reached the maxima at an RF power of 100 W and then they decreased with further increase of the RF power.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2005年第4期1885-1889,共5页
Acta Physica Sinica
基金
国家自然科学基金 (批准号 :5 992 5 5 13
5 0 3 2 3 0 0 7)
国家高技术研究发展计划 (批准号 :2 0 0 3AA3 0 5 670 )
中国科学院"百人计划"资助的课题~~
关键词
等离子增强化学气相沉积
类金刚石薄膜
射频功率
结构性能
plasma-enhanced chemical vapor deposition
diamond-like carbon films
RF power
structure and properties
