Two-dimensional(2D)layered materials have attracted extensive research interest in the field of high-performance photodetection due to their high carrier mobility,tunable bandgap,stability,other excellent properties.H...Two-dimensional(2D)layered materials have attracted extensive research interest in the field of high-performance photodetection due to their high carrier mobility,tunable bandgap,stability,other excellent properties.Herein,we propose a gate-tunable,high-performance,self-driving,wide detection range phototransistor based on a 2D PtSe_(2)on silicon-oninsulator(SOI).Benefiting from the strong built-in electric field of the PtSe_(2)/Si heterostructure,the phototransistor has a fast response time(rise/fall time)of 36.7/32.6μs.The PtSe_(2)/Si phototransistor exhibits excellent photodetection performance over a broad spectral range from ultraviolet to near-infrared,including a responsivity of 1.07 A/W and a specific detectivity of 6.60×10^(9)Jones under 808 nm illumination at zero gate voltage.The responsivity and specific detectivity of PtSe_(2)/Si phototransistor at 5 V gate voltage are increased to 13.85 A/W and 1.90×10^(10) Jones under 808 nm illumination.Furthermore,the fabricated PtSe_(2)/Si phototransistor array shows excellent uniformity,reproducibility,long-term stability in terms of photoresponse performance with negligible variation between pixel cells.The architecture of present PtSe_(2)/Si on SOI platform paves a new way of a general strategy to realize high-performance photodetectors by combining the advantages of both 2D materials and conventional semiconductors which is compatible with current Si-complementary metal oxide semiconductor(CMOS)process.展开更多
在SOI晶圆材料的基础上,设计了压力敏感结构,提高了传感器的高温稳定性;采用敏感芯片背孔引线技术,将硅敏感芯片的正面和硼玻璃进行气密性阳极键合,通过在硼玻璃对应位置加工电极连接孔,实现芯片电极与外部管脚的电气连接,形成无引线封...在SOI晶圆材料的基础上,设计了压力敏感结构,提高了传感器的高温稳定性;采用敏感芯片背孔引线技术,将硅敏感芯片的正面和硼玻璃进行气密性阳极键合,通过在硼玻璃对应位置加工电极连接孔,实现芯片电极与外部管脚的电气连接,形成无引线封装结构;利用ANSYS软件对敏感芯片进行了力学仿真,对高温敏感芯体进行了热应力分析,完成了无引线封装结构的优化及制作。通过性能测试,该传感器测量范围为0~0.2 MPa,灵敏度为55.0 m V/MPa,非线性误差小于0.2%。展开更多
基金the National Natural Science Foundation of China(Nos.62090030/62090031,51872257,51672244,and 62274145)the National Key R&D Program of China(No.2021YFA1200502)+1 种基金the Natural Science Foundation of Zhejiang Province(No.LZ20F040001)the Zhejiang Province Key R&D Pprogram(No.2020C01120).
文摘Two-dimensional(2D)layered materials have attracted extensive research interest in the field of high-performance photodetection due to their high carrier mobility,tunable bandgap,stability,other excellent properties.Herein,we propose a gate-tunable,high-performance,self-driving,wide detection range phototransistor based on a 2D PtSe_(2)on silicon-oninsulator(SOI).Benefiting from the strong built-in electric field of the PtSe_(2)/Si heterostructure,the phototransistor has a fast response time(rise/fall time)of 36.7/32.6μs.The PtSe_(2)/Si phototransistor exhibits excellent photodetection performance over a broad spectral range from ultraviolet to near-infrared,including a responsivity of 1.07 A/W and a specific detectivity of 6.60×10^(9)Jones under 808 nm illumination at zero gate voltage.The responsivity and specific detectivity of PtSe_(2)/Si phototransistor at 5 V gate voltage are increased to 13.85 A/W and 1.90×10^(10) Jones under 808 nm illumination.Furthermore,the fabricated PtSe_(2)/Si phototransistor array shows excellent uniformity,reproducibility,long-term stability in terms of photoresponse performance with negligible variation between pixel cells.The architecture of present PtSe_(2)/Si on SOI platform paves a new way of a general strategy to realize high-performance photodetectors by combining the advantages of both 2D materials and conventional semiconductors which is compatible with current Si-complementary metal oxide semiconductor(CMOS)process.
文摘在SOI晶圆材料的基础上,设计了压力敏感结构,提高了传感器的高温稳定性;采用敏感芯片背孔引线技术,将硅敏感芯片的正面和硼玻璃进行气密性阳极键合,通过在硼玻璃对应位置加工电极连接孔,实现芯片电极与外部管脚的电气连接,形成无引线封装结构;利用ANSYS软件对敏感芯片进行了力学仿真,对高温敏感芯体进行了热应力分析,完成了无引线封装结构的优化及制作。通过性能测试,该传感器测量范围为0~0.2 MPa,灵敏度为55.0 m V/MPa,非线性误差小于0.2%。
