he present paper focuses on the modifying effects of ion beam mixing, ion im-planting and ion sputtering on hydrogen evolution electrodes. It was discovered thatthe four types of electrodes possessed excellent catalyt...he present paper focuses on the modifying effects of ion beam mixing, ion im-planting and ion sputtering on hydrogen evolution electrodes. It was discovered thatthe four types of electrodes possessed excellent catalytic activity in acid or alkalinemedia and potential stability in long term electrolysis of water under high currentdensity. Their stability and applying life-span greatly surpass those of other elec-trodes activated by electrodepositing and other method. The effects of temperatureand roughness on function of electrodes were also examined. XPS and AES wereapplied to analyse the surface composition and bond states of the electrodes, andthe distribution of concentration varying with depth, and to explain the law of theexperiments .展开更多
Ion implantation, as currently practiced, has been shown to be quite effective in production of semiconductor and integrated circuit as well as surface modification of metal. But it is a line-of-sight process and if t...Ion implantation, as currently practiced, has been shown to be quite effective in production of semiconductor and integrated circuit as well as surface modification of metal. But it is a line-of-sight process and if the target is non-planar, target manipulation, such as translation or rotation, is required to implant all sides of the target. Even with sophisticated target manipulation system, the performance of beam-line implantor is still limited by the retained dose problem,, i.e. the maximum dose retained by the target is governed by the angle of incidence of the beam. In order to achieve reasonable dose uniformity on targets with curved surfaces, target masking may be employed to restrict the ion beam angle of incidence. Even though the target has sufficient symmetry to accommodate masking, the masking degrades the system performance, and furthermore, sputtering of the masking contaminates the target.展开更多
文摘he present paper focuses on the modifying effects of ion beam mixing, ion im-planting and ion sputtering on hydrogen evolution electrodes. It was discovered thatthe four types of electrodes possessed excellent catalytic activity in acid or alkalinemedia and potential stability in long term electrolysis of water under high currentdensity. Their stability and applying life-span greatly surpass those of other elec-trodes activated by electrodepositing and other method. The effects of temperatureand roughness on function of electrodes were also examined. XPS and AES wereapplied to analyse the surface composition and bond states of the electrodes, andthe distribution of concentration varying with depth, and to explain the law of theexperiments .
基金Project supported by the National Natural Science Foundation of China
文摘Ion implantation, as currently practiced, has been shown to be quite effective in production of semiconductor and integrated circuit as well as surface modification of metal. But it is a line-of-sight process and if the target is non-planar, target manipulation, such as translation or rotation, is required to implant all sides of the target. Even with sophisticated target manipulation system, the performance of beam-line implantor is still limited by the retained dose problem,, i.e. the maximum dose retained by the target is governed by the angle of incidence of the beam. In order to achieve reasonable dose uniformity on targets with curved surfaces, target masking may be employed to restrict the ion beam angle of incidence. Even though the target has sufficient symmetry to accommodate masking, the masking degrades the system performance, and furthermore, sputtering of the masking contaminates the target.
