摘要
对离子束混合技术制备的C SiC阻氢涂层进行了SEM形貌观察 ,比较了在相同组分的C SiC靶材下采用不同的Ar+ 离子轰击剂量 ,在相同的Ar+ 离子轰击剂量下采用不同组分的C SiC靶材所制备涂层的表面形貌特征 ,并由二次离子质谱 (SIMS)分析了C SiC涂层的阻氢性能 .结果表明 ,所制备C SiC涂层的表面形貌与靶材组分以及Ar+ 离子轰击剂量有关 ,不同的形貌特征对涂层的阻氢性能影响不同 .
The morphology observation for the C SiC coatings prepared by ion beam mixing was carried out. Comparison between the samples with different Ar + bombardment doses or different target materials is made. Hydrogen profiles for C SiC coatings and substrate were analyzed by SIMS. The results show that the morphology of the deposited C SiC coatings depends on the composition of the specimens and doses of Ar + bombardment. The effect of morphology of the C SiC coatings on hydrogen resistance is discussed.
出处
《四川大学学报（自然科学版）》
CAS
CSCD
北大核心
2002年第1期65-68,共4页
Journal of Sichuan University(Natural Science Edition)
基金
中国工程物理研究院科研基金
