摘要
采用等离子辅助热丝化学气相沉积 (PAHFCVD)装置进行了金刚石薄膜的制备。并运用X射线衍射 (XRD)和扫描电子显微镜 (SEM)测试手段对沉积的金刚石薄膜进行了观察分析。在甲烷与氢气体积比为 2∶98、基体温度为 80 0℃、等离子体偏压 40 0V、沉积气压 4kPa的沉积条件下可获得晶形完整的金刚石膜 ,其沉积速率可达 1 1 μm·h- 1 。
Diamond film was produced by plasma assistant hot-filament chemical vapor deposition. XRD and SEM were carried out to investigate the surface characteristics of the films. Under the conditions of the flow rate of CH 4∶H 2 is 2∶98,the temperature is 800 ℃,the voltage of plasma is 400 V and the deposition pressure is 4 kPa, the diamond film is good and the deposition speed is about 1 1 μm·h -1.
出处
《青岛科技大学学报（自然科学版）》
CAS
2004年第1期36-38,共3页
Journal of Qingdao University of Science and Technology:Natural Science Edition
基金
山东省自然科学基金项目 (Y2 0 0 1F10 )
