摘要
本文采用脉冲激光淀积方法(PLD)制备了MgF2光学薄膜,并对其表面形貌以及光学性质进行了测试分析, X射线光电子能谱分析显示MgF2样品具有很好的化学组分配比, F/Mg原子比在1.9-2.1之间,接近于体材料;在可见光波段其光学透过率为60%-80%,在红外波段更是达到了90%以上,由KK变换计算MgF2的折射率大约为1.39,也接近于体材料的折射率1.38。
Optical thin films of MgF2 were successfully fabricated by pulsed laser deposition technique. The morphology and optical properties were investigated. The transmittance was 60%-80% in the visible light range, and more than 90% in the infrared range. The XPS showed the atom ratio of F: Mg in the obtained film was 1.9-2.1, very close to the bulk material. The refractive index of MgF2 thin film was -1.39 resulted from K-K calculation, also close to the value of 1.38 of the bulk MgF2.
出处
《量子电子学报》
CAS
CSCD
北大核心
2004年第1期48-50,共3页
Chinese Journal of Quantum Electronics
基金
国家自然科学基金资助项目(59976038)