摘要
薄膜技术作为材料制备的一种新技术,在现代科技领域中有着广泛应用。人们对薄膜的沉积机理通过理论和实验进行了比较深入的研究,其中计算机模拟变得日趋重要。主要阐述目前薄膜沉积机理的计算机模型:LG模型、Eden模型、DLA模型及RLA模型,相应计算机模拟技术的发展以及面临的问题和发展方向。
Thin film technology is widely used in various scientific and technological fields as one of new
material manufacture technologies. Much theoretical and experimental work has been done on thin film deposition,and computer simulation is becoming an important method in the area. In this paper,some computer simulation methods are described,and numerical models, including LG model,Eden model,DLA model and RLA model,are reviewed. The current status and existing questions are discussed,and future directions are suggested.
出处
《材料导报》
EI
CAS
CSCD
2003年第F09期154-157,共4页
Materials Reports
