摘要
当前,一种新型纳米压印技术被提出并开始逐步用于后续替代光刻机,纳米压印的基础原理为将硅胶覆盖在一个图形基板上,待硅胶完全与基板贴合后固化,然后剥离掉硅胶,最后将硅胶压到匀胶好的晶片表面进行紫外光照射及加热,从而实现把硅胶表面的图形转移到光刻胶上。纳米压印技术已经广泛应用到图形化蓝宝石衬底上,一种与图形化蓝宝石衬底相接近的新型图形化蓝宝石复合衬底已经被提出并开始商业化,该产品主要采用的依然是原始的光刻方法进行图形化转移,主要论述纳米压印技术在图形化蓝宝石复合衬底为主的光电领域应用的可行性。
At present,a new nanoimprinting technology has been proposed and gradually used to replace the stepper.The basic principle of nanoimprinting was to cover the silica gel on a pattern substrate,and solidify after the silica gel was fully bonded with the substrate,then peel off the silica gel,finally press the silica gel onto the evenly glued wafer surface for UV irradiation and heating,so as to transfer the pattern on the silica gel surface to the photoresist.The nanoimprinting technology has been widely applied to patterned sapphire substrates,a new type of patterned sapphire composite substrate,similar to the patterned sapphire substrate,which has been proposed and commercialized,and mainly used the original lithography method for patterned transfer.We mainly discussed the feasibility of the application of nanoimprinting technology in the optoelectronic field focused on patterned sapphire composite substrates.
作者
杨志伟
刘禹辰
叶金羽
YANG Zhiwei;LIU Yuchen;YE Jinyu(Schoolof Intelligent Manufacturing,Jilin Vocational College of Industry and Technology,Jilin 132013,China)
出处
《新技术新工艺》
2023年第10期17-25,共9页
New Technology & New Process
基金
吉林工业职业技术学院2023年度教育学会教学类课题(23jyy04)。
关键词
光刻机
紫外光
纳米压印
硅胶
图形化蓝宝石复合衬底
photoetching machine
ultraviolet light
nanoimprint
silica gel
patterned sapphire composite substrate
