摘要
Nb/Al-AlO x/Nb约瑟夫森结构成的低温超导器件有着广泛应用,高质量的S-I-S约瑟夫森结制备的关键之一在于制备高质量的三层膜。三层膜的质量可由许多属性参数影响,比如剩余电阻比R.R.R、超导转变温度T c、表面粗糙度、应力、铝膜厚度等等。通过对薄膜的溅射沉积条件与上述参数进行分析研究,确定最佳的生长条件。调节不同的氧化工艺条件,可以获得约瑟夫森结的不同临界电流密度。
Low temperature superconducting devices based on Nb/Al-AlO x/Nb Josephson junctions are widely used,one of the keys to fabricate high-quality S-I-S Josephson junctions is to deposit high-quality Nb/Al-AlO x/Nb trilayer.Many property parameters can influence the quality of trilayer,such as the residual resistance ratio(R.R.R),superconducting transition temperature(T c),surface roughness,film stress,the thickness of aluminum(Al)film and so on.By analyzing the relationships of the parameters above with different sputtering conditions,the best deposition condition can be determined.Also,different critical current densities of Nb/Al-AlO x/Nb trilayer can be obtained by controlling the oxidation pressure and time of Al.
作者
高鹤
王仕建
徐达
李劲劲
王雪深
钟青
GAO He;WANG Shi-jian;XU Da;LI Jin-jin;WANG Xue-shen;ZHONG Qing(Center for Advanced Measurement Science,National Institute of Metrology,Beijing 102200,China)
出处
《计量学报》
CSCD
北大核心
2023年第5期765-770,共6页
Acta Metrologica Sinica
基金
中国计量科学研究院基本科研业务(AKY1946,AKYZD2012,AKYZZ2124)。
