摘要
针对高压脉冲幅度的量值传递需求,开展了脉冲幅度1~20 kV、脉宽1~100μs的高压脉冲幅度校准装置设计。校准装置以高压MOSFET器件为核心,搭建多级Marx结构实现高压脉冲成型,同时通过截尾回路的设计缩短脉冲下降时间,实现矩形脉冲波形的输出。在Marx结构基础上开展装置整体设计,通过触发脉冲信号及高压直流电源电压调节脉宽与幅度,通过隔离电源及光信号保证了高压隔离强度。装置采用高准确度高压探头和数据采集卡构成校准装置的内部测试系统,其测量值作为校准装置的标准量值,经评定装置脉冲幅度不确定度为2%,并通过两台比对法进行了验证。采用其他多型高压探头对校准装置进行实验测试,结果表明与低压脉冲校准源测试相比,高压脉冲可明显有效地表征高压探头的性能及测量准确度,同时本装置也可作为高压脉冲发生器应用于脉冲功率领域其他用途。
In order to meet the need of magnitude transmission of high voltage pulse amplitude, this paper develops the design of high voltage pulse amplitude calibration device with pulse amplitude of 1-20 kV and pulse width of 1-100 μs. The calibration device takes the high voltage MOSFET as the core, and builds up a multi-stage Marx structure to achieve high voltage pulse. At the same time, the truncation circuit greatly reduces the pulse fall time and realizes the output of rectangular pulse waveform. On the basis of the Marx structure, the unit is built as a whole.The pulse width and amplitude can be adjusted by triggering pulse and high voltage DC power supply voltage, and the high voltage isolation is guaranteed by isolating power module and optical signal. The device uses high-precision high voltage probe and oscilloscope to constitute the internal measurement module. The measurement value is the standard value of the calibration device. The uncertainty of the pulse amplitude of the device is evaluated, and it is verified by comparison of two measurement standards. The calibration device is tested with other types of high voltage probes.The results show that, compared with the low-voltage pulse calibration source, the high voltage pulse can effectively characterize the performance and measurement accuracy of the high voltage probe, achieve the calibration of the high voltage probe, and the device can also be applied as a high voltage pulse source for other purposes in the field of pulse power field.
作者
龙国浩
袁汉
何鹏
郭晓东
王凌云
Long Guohao;Yuan Han;He Peng;Guo Xiaodong;Wang Lingyun(The Center of Metrology and Testing,CAEP,Mianyang 621900,China;Institute of Fluid Physics,CAEP,Mianyang 621900,China)
出处
《强激光与粒子束》
CAS
CSCD
北大核心
2023年第2期138-142,共5页
High Power Laser and Particle Beams
