摘要
设计并制作了阳极屏蔽电沉积系统,采用5,5-二甲基乙内酰脲(DMH)体系镀铜液,在温度(23.5±1)℃下电沉积30 s,研究了极间距和工作电压的变化对定域电沉积效果的影响。结果表明,阳极屏蔽定域沉积区域随极间距和工作电压的增大而扩大,且极间距变化对沉积图案定域性的影响大于工作电压变化带来的影响。
Localized electrodeposition of copper was conducted in a 5,5-dimethylhydantoin(DMH) bath at temperature(23.5 ± 1) ℃ for 30 s using a home-designed electrodeposition system with a shielding anode. The effects of interelectrode gap and operating voltage on the localized electrodeposition were studied. The results showed that the localized deposition region when using a shielding anode expands with the increasing of interelectrode gap or operating voltage. The variation in interelectrode gap has greater impact on the localized deposition area than the variation in operating voltage.
作者
罗龚
陈茂琳
袁原
蔡佳琪
林依璇
李书弘
李宁
LUO Gong;CHEN Maolin;YUAN Yuan;CAI Jiaqi;LIN Yixuan;LI Shuhong;LI Ning(School of Mechanical and Electrical Engineering,Guangdong University of Petrochemical Technology,Maoming 525000,China;School of Chemistry and Chemical Engineering,Harbin Institute of Technology,Harbin 150001,China;College of Chemistry,Guangdong University of Petrochemical Technology,Maoming,525000,China)
出处
《电镀与涂饰》
CAS
北大核心
2023年第1期35-41,共7页
Electroplating & Finishing
基金
广东省特色创新自然科学类项目(2021KTSCX079)
广东省茂名市科技计划项目(2021019)
广东石油化工学院人才引进项目(2019rc06)
广东省教育厅省级大学生创新创业训练项目(73322077)。
关键词
铜
定域性电沉积
阳极屏蔽
极间距
工作电压
5
5-二甲基乙内酰脲
copper
localized electrodeposition
shielding anode
interelectrode gap
operating voltage
5
5-dimethylhydantoin
