摘要
为了配制适用于JGS1光学石英玻璃超声波精细雾化抛光的特种抛光液,以材料去除率和表面粗糙度为评价指标,设计正交试验探究抛光液中各组分含量对雾化抛光效果的影响,并对材料去除机制进行简要分析。结果表明:各因素对材料去除率的影响程度由大到小分别为SiO_(2)、pH值、络合剂、助溶剂和表面活性剂,对表面粗糙度影响程度的顺序为SiO2、表面活性剂、pH值、助溶剂和络合剂;当磨料SiO_(2)质量分数为19%,络合剂柠檬酸质量分数为1.4%,助溶剂碳酸胍质量分数为0.2%,表面活性剂聚乙烯吡咯烷酮质量分数为0.9%,pH值为11时,雾化抛光效果最好,材料去除率为169.5 nm/min,表面粗糙度为0.73 nm;去除过程中石英玻璃在碱性环境下与抛光液发生化学反应,生成低于本体硬度的软质层,易于通过磨粒机械作用去除。使用该抛光液进行传统化学机械抛光和雾化化学机械抛光,比较两者的抛光效果。结果表明:两者抛光效果接近,但超声雾化方式抛光液用量少,仅为传统抛光方式的1/7。
In order to prepare a special polishing slurry suitable for ultrasonic fine atomization polishing of JGS1 optical quartz glass, the orthogonal experiment was designed to explore the influence of the content of each component in the polishing slurry on the atomization polishing effect, and the material removal mechanism was briefly analyzed.The results show that the order of influence degree on the material removal rate is SiO_(2),pH value, cosolvent, complexing agent and surfactant, the order of influence degree on the surface roughness is SiO;,surfactant, pH value, cosolvent and complexing agent.When the mass fraction of SiO_(2) abrasive is 19%,the mass fraction of citric acid cosolvent is 1.4%,the mass fraction of guanidine carbonate complexing agent is 0.2%,the mass fraction of polyvinylpyrrolidine surfactant is 0.9%,and pH value is 11,the best atomization polishing effect is got, and the material removal rate is 169.5 nm/min, the surface roughness is 0.73 nm.In the removal process, the quartz glass reacts with the polishing slurry in alkaline environment to form a soft layer lower than the bulk harness, which is easy to be removed by abrasive mechanical action.Traditional chemical mechanical polishing and ultrasonic atomization chemical mechanical polishing was performed by using the prepared polishing slurry to compare the polishing effect.It is found that the polishing effects of the two methods are similar, but the amount of polishing fluid in ultrasonic atomization method is only 1/7 of that in traditional polishing method.
作者
苑晓策
李庆忠
杨思远
YUAN Xiaoce;LI Qingzhong;YANG Siyuan(College of Mechanical Engineering,Jiangnan University,Wuxi Jiangsu 214122,China)
出处
《润滑与密封》
CAS
CSCD
北大核心
2021年第11期103-108,共6页
Lubrication Engineering
基金
国家自然科学基金项目(51175228).
关键词
化学机械抛光
精细雾化
石英玻璃
抛光液
正交试验
chemical mechanical polishing(CMP)
fine atomization
quartz glass
polishing slurry
orthogonal test
