摘要
介绍了纯铬靶材的主要制备工艺流程及研究现状,介绍了采用热等静压方法制备的纯铬靶材圆柱体致密度高达99.86%,晶粒细小、溅射性能优异;阐述了高纯溅射铬靶材的特性,分析了高纯铬靶材存在的问题;探讨和展望了高纯铬溅射靶材的发展趋势。
The main preparation process and research status of pure chromium target materials were introduced.AISO,introdced the density of pure chromium target cylinder prepared by hot isostatic pressure is up to 99.86%,with fine grain and excellent sputtering performance.The characteristics of high purity sputtered chromium target were described and the problems existing in high purity chromium target were analyzed.The development trend of high purity chromium sputtering target was discussed and prospected.
作者
徐飞
布国亮
杨万朋
成佳佳
肖夫兰
XU Fei;BU Guoliang;YANG Wanpeng;CHENG Jiajia;XIAO Fulan(Xi’an Jiaye Aviation Technology Co.,Ltd.,Xi'an 710089,China)
出处
《铸造技术》
CAS
2020年第12期1197-1200,共4页
Foundry Technology
关键词
磁控溅射
高纯铬靶材
研究现状
发展趋势
magnetron sputtering
high purity chromium target
research status
development trend
