摘要
文章通过调研国内外多弧离子镀制备(Ti,Cr)N纳米复合膜的研究,分析了偏压、弧电流等制备参数对薄膜机械性能的影响。调研发现:在TiN薄膜中引入Cr元素后,有效地提升了薄膜的机械性能;而偏压和弧电流在多弧离子镀制备(Ti,Cr)N的过程中,对成膜性质有很重要的作用。从理论原理来看,偏压提供了加速离子所需的能量,弧电流则是弧光放电的基础。它们的共同特征是数值增大会给离子带来更多的能量,加剧离子对衬底的撞击,从而提高膜基结合力和薄膜硬度。不过因为作用机理的不同,它们对薄膜的影响也不都是正面的,比如偏压较大时会降低薄膜的厚度和沉积速率,而弧电流过大则会增加大液滴的形成概率。因此,在多弧离子镀制备(Ti,Cr)N薄膜的过程中,应该在综合评估各实验参数的影响后进行优化,从而提高薄膜机械性能。
This paper summarized the main results of the research on the preparation of(Ti,Cr)N nanocomposite film by multi-arc ion plating,and investigated the effects of deposition parameters such as bias voltage and arc current on the properties of the films.It is found that the introduction of Cr element in TiN film effectively improved the film’s hardness,wear resistance and corrosion resistance;meanwhile,the film’s properties are also affected by bias voltage and arc current.From a theoretical point of view,the bias voltage provides the energy to accelerate the ions bombarding the substrate,and the arc current is the basis of the arc discharge.Their common feature is that increasing their value will bring more energy to the ions,increasing the impact of the ions on the substrate,thereby increasing the film’s adhesion strengthen and the hardness.However,due to the different mechanism of action,their effects on the film are not always positive.For example,when the large bias voltage is applied,the thickness and deposition rate of the film are lowered,and the arc current is excessively increased to increase the number of large droplets.Consequently,when prepare(Ti,Cr)N films by multi-arc ion plating,the optimization should be carried out after comprehensive evaluation of the influence of each experimental parameters,so as to improve the mechanical properties of the film.
作者
郑小龙
沈华刚
任建玮
宋杰远
孙珲
Zheng Xiaolong;Shen Huagang;Ren Jianwei;Song Jieyuan;Sun Hui(Engineering Physics Laboratory,Qingdao Topscomm Communication Co.,Ltd,Shandong,Qingdao,266109;School of Space Science and Physics,Shandong University,Shandong,Weihai,264209)
出处
《科技智囊》
2020年第10期72-75,共4页
Think Tank of Science & Technology
