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射频磁控溅射非晶Al–Mg–B薄膜的制备及性能

Preparation and properties of amorphous Al–Mg–B thin film by radio frequency magnetron sputtering
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摘要 利用AlMgB14靶在高速钢上通过磁控溅射制备了Al–Mg–B薄膜。采用X射线衍射仪、原子力显微镜和辉光放电光谱仪对薄膜的组成结构进行了表征,采用纳米压痕仪和多功能摩擦磨损试验仪测试了薄膜的硬度及摩擦学性能。结果表明,提高薄膜的沉积温度或溅射功率都会增加薄膜中B元素的含量,使得薄膜硬度提高,摩擦因数和磨损量下降。 Al-Mg-B thin films were prepared on a high-speed steel substrate by magnetron sputtering with an AlMgB14 target.The composition and structure of the thin film were characterized by X-ray diffractometry,atomic force microscopy,and glow discharge optical emission spectrometry.The hardness and tribological properties of the thin film were tested by nanoindenter and multi-functional friction and wear tester.The results showed that the rise of deposition temperature or sputtering power resulted in the increase of the content of B element in the thin film,increasing its hardness and decreasing its friction factor and wear-induced loss of mass.
作者 庄蕾 王家珂 ZHUANG Lei;WANG Jiake(School of Intelligent Manufacturing,Yangzhou Polytechnic Institute,Yangzhou 225127,China;不详)
出处 《电镀与涂饰》 CAS CSCD 北大核心 2020年第17期1147-1151,共5页 Electroplating & Finishing
基金 2017年江苏省青蓝工程优秀青年骨干教师资助项目 扬州市科技计划项目市校合作专项(YZ2019126) 扬州工业职业技术学院校级科研课题(2019xjzk011) 扬州工业职业技术学院校访问工程师项目。
关键词 铝镁硼薄膜 磁控溅射 功率 沉积温度 耐磨性 aluminum magnesium boride thin film magnetron sputtering power substrate temperature wear resistance
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