摘要
通过改变Cr靶电流强度,在国产AIP 01型多弧离子镀膜机上制备不同Cr含量的(Ti,Cr)N复合薄膜。研究Cr的添加对薄膜硬度、薄膜相结构及晶格常数等性能的影响,探讨薄膜的硬化机理。结果表明:Cr的加入可显著提高复合薄膜的硬度,显微硬度可高达HV2665;复合薄膜是以TiN为基的(Ti,Cr)N薄膜,薄膜中没有独立的CrN和Cr2N相,同时由于Cr的加入,薄膜的择优取向从(111)晶面逐渐过渡到(200)晶面,随Cr靶电流的增大,所得(Ti,Cr)N复合膜中出现单质Cr。
（Ti, Cr）N composite films with different Cr contents were deposited with AIP- 01 multi-arc ion plating by the method of changing the current of Cr target. The influences of Cr on the phase structure, hardness and lattice of the composite films were investigated. The strengthening mechanism of the film was discussed. The results show： the hardness of the composite films can be enhanced dramatically by the incorporation of Cr, and its hardness can reach HV2 665. The composite film is （Ti, Cr）N film based on TiN film. No CrN and Cr2 N single-phase compounds exist in the composite film. The preffered orientation of the composite films changes from （111） to （200） because of the incorporation of Cr. With the increasing of Cr current, there exists simple substance Cr in （Ti, Cr）N composite films.
出处
《中国有色金属学报》
EI
CAS
CSCD
北大核心
2006年第7期1227-1232,共6页
The Chinese Journal of Nonferrous Metals
基金
广东省自然科学基金资助项目(116B65130)
广东省科技攻关计划资助项目(102B26650)
