摘要
采用磁控溅射技术在硅基底上交替沉积WSx、W以及DLC膜层制备WSx/W/DLC/W多层膜。利用X射线衍射仪、扫描电镜、纳米压痕仪等对多层膜的微观结构和力学性能进行了表征,使用球盘式摩擦磨损试验机测试了多层膜在大气中的摩擦学性能。结果表明:多层膜表面均光滑致密。随着周期中W单层厚度的增加,多层膜中出现α-W、W2C和β-WC1-x结晶相,多层膜的硬度大幅提高(6 nm时具有极大值17.3 GPa),摩擦因数呈下降趋势,结合力逐渐降低,磨损率先降低后升高。W单层厚度为6 nm的多层膜的耐磨性能最佳,磨损率约为1.4×10^-14m^3·N^-1·m^-1。
WSx/W/DLC/W multilayer films were prepared by magnetron sputtering technique and alternate deposition of WSx,W and diamond-like carbon(DLC)layers on silicon substrates.The microstructure,mechanical properties and tribological behaviors in the atmosphere of the films were characterized by X-ray diffractometry,scanning electron microscopy,nano-indenter and ball-on-disk wear tester.The results show that the surface of all the multilayer films is smooth and dense.As the thickness of single W interlayer increases in the modulation period,α-W,W2C,andβ-WC1-x crystalline phases are formed in the multilayer films.The hardness of the multilayer films is greatly improved(up to 17.3 GPa at single W interlayer thickness of 6 nm),the friction coefficient shows a downward trend,the adhesion to the substrate is gradually reduced and the wear rate decreases first and then increases.The multilayer film with single W interlayer thickness of 6 nm exhibits the best wear resistance,and its wear rate is about 1.4×10^-14 m^3·N^-1·m^-1.
作者
郑晓华
刘涛
杨烁妍
王贡启
杨芳儿
Zheng Xiaohua;Liu Tao;Yang Shuoyan;Wang Gongqi;Yang Fanger(Zhejiang University of Technology,Hangzhou 310014,China)
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2020年第4期1295-1300,共6页
Rare Metal Materials and Engineering
基金
浙江省自然科学基金(LY15E010007)。
