摘要
将钼钛合金靶材在同一溅射设备、同一溅射工艺下进行磁控溅射实验,研究不同粒径钼粉原料对靶材溅射薄膜性能的影响。通过XRD、SEM和直流四探针法分析结果表明,颗粒大小均匀、无团聚的大粒径钼粉制备出的靶材,其溅射薄膜性能更优异。
The Mo-Ti thin film was prepared based on glass substrate with Mo-Ti as the target by magnetic control sputtering equipment,characterized by XRD,SEM and four probe DC method and the effect of molybdenum powder particle size on the properties of Mo-Ti film was discussed.The results show that the property of Mo-Ti film was better for the large particles size with uniform and free-agglomeration of molybdenum powder.
作者
席莎
安耿
李晶
韩强
刘仁智
赵虎
XI Sha;AN Geng;LI Jing;HAN Qiang;LIU Ren-zhi;ZHAO Hu(Technical Center,Jinduicheng Molybdenum Co.,Ltd.,Xi'an 710077,Shaanxi,China)
出处
《中国钼业》
2019年第6期50-53,共4页
China Molybdenum Industry
关键词
钼粉
钼钛靶材
磁控溅射
微观组织
molybdenum powder
molybdenum titanium target
magnetron sputtering
miscrostructure
