摘要
非晶碳薄膜主要由sp^3碳原子和sp^2碳原子相互混杂的三维网络构成,具有高硬度、低摩擦系数、耐磨损、耐腐蚀以及化学稳定性等优异性能。然而传统制备方法难以实现薄膜结构及其性能的综合调控,高功率脉冲磁控溅射因其离子沉积特性受到领域内专家学者的关注。总结了近年来关于高功率脉冲磁控溅射制备非晶碳薄膜材料的研究进展。重点介绍了高功率脉冲磁控溅射石墨靶的放电特性,指出了其在沉积非晶碳薄膜过程中获得高碳原子离化率的条件。针对离化率和沉积速率低,主要从提高碳原子离化率和碳离子传输效率等角度,介绍了几种改进的高功率脉冲磁控溅射方法。并对比了不同高功率脉冲磁控溅射方法中的碳原子离化特征、薄膜沉积速率、结构和力学性能。进一步地,探讨了高功率脉冲磁控溅射在制备含氢非晶碳薄膜和金属掺杂非晶碳薄膜中的优势及其在燃料电池、生物、传感等前沿领域的应用。最后,对高功率脉冲磁控溅射石墨靶的离子沉积特性、非晶碳薄膜制备及其应用研究趋势进行了展望。
The amorphous carbon thin film is mainly composed of a three-dimensional network in which sp^3 carbon atoms and sp^2 carbon atoms are intermingled with each other.It has excellent properties such as high hardness,low friction coefficient, abrasion resistance,corrosion resistance,chemical stability,etc.However,the conventional preparation methods are hard to realize the integrated control on thin film structure and performances.Due to ion deposition characteristics,high power impulse magnetron sputtering has attracted attentions from experts and researchers in the field.Recent studies on the preparation of amorphous carbon thin film by high power impulse magnetron sputtering were reviewed.The discharge characteristics of high power impulse magnetron sputtering graphite target were analyzed to point out the conditions for obtaining high ionization degree of sputtered carbon atoms in the processes of depositing amorphous carbon thin films.For low ionization degree and deposition rate,several improved high power impulse magnetron sputtering methods were introduced from the perspectives of increasing the ionization degree of carbon atoms and carbon ion transportation efficiency.The characteristics of carbon atom ionization,film deposition rate,structure and mechanical properties by different high power impulse magnetron sputtering methods were compared.Furthermore,the advantages of high power impulse magnetron sputtering in the preparation of hydrogenated amorphous carbon thin films and metal doped amorphous carbon thin films,and the applications in the frontier fields such as fuel cells,biology and sensing were discussed.Finally,the ion deposition characteristics of high power impulse magnetron sputtering graphite target,the preparation of amorphous carbon thin films and the application trends were prospected.
作者
左潇
孙丽丽
汪爱英
柯培玲
ZUO Xiao;SUN Li-li;WANG Ai-ying;KE Pei-ling(Key Laboratory of Marine Materials and Related Technologies,Zhejiang Key Laboratory of Marine Materials and Protective Technologies,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,China;Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China)
出处
《表面技术》
EI
CAS
CSCD
北大核心
2019年第9期53-63,共11页
Surface Technology
基金
国家自然科学基金(11705258)
中国科学院A类战略性先导科技专项(XDA22010303)
宁波市科技攻关2025重大项目(2018B10014)
宁波市江北区重大科技项目(201801A03)~~
