摘要
Ni Zn铁氧体薄膜具有优良的软磁特性、良好的机械耐磨性、稳定的化学性能、较高的铁磁共振频率和高电阻率等诸多优点,已成为铁氧体薄膜领域重要的研究方向。结合通讯系统器件发展趋势,本文对Ni Zn铁氧体薄膜材料的性能研究及应用进行了介绍,着重从薄膜的制备技术和添加剂等方面综述了当今国内外对Ni Zn铁氧体薄膜研究现状及最新研究进展,并指出了今后Ni Zn铁氧体薄膜研究的主要方向。
NiZn ferrite thin films have some advantages, such as the excellent soft magnetic properties, good mechanical wear resistance, stable chemical property, higher ferromagnetic resonance frequency and high resis- tivity. It has became an important research direction in the field of ferrite thin films, In the paper, combining with the development trend of communication system devices, the performance researches and applications of NiZn ferrite thin films materials are introduced. The preparative techniques, the process conditions, and addi- tives of NiZn ferrite thin films are emphasized and reviewed with reference NiZn ferrite thin films. Finally, the future work of NiZn ferrite thin films, including prospective research aspects , is proposed.
出处
《信息记录材料》
2015年第2期53-58,共6页
Information Recording Materials
